AIC/FAIC Conference at the National Gallery of Art | Congrats to Benjamin Levy!

Congratulations to PhD Candidate Benjamin Levy, who recently presented his dissertation research on the photographic halftone as part of the AIC/FAIC  symposium “Photomechanical Prints: History, Technology, Aesthetics, and Use” hosted by the National Gallery of Art in Washington, DC!

Conservators, curators, scholars, and practitioners from all over the world gathered to discuss this often neglected area that touches art and art history, science and technology, material and visual culture. In addition to the three days of talks, Ben was accepted into two hands-on workshops on historic processes which only a handful of practitioners are keeping alive. Jon Goodman of Heron Press taught a course on photogravure and Yamamoto-San of Benrido Atelier travelled from Kyoto to lead a class on collotype. Please join us in congratulating Ben on this well deserved opportunity.